Industrial Laser System – Laser Micro Machining System

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Ultrafast Laser System for Selective Laser Etching (SLE)

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Ultrafast laser system for laser micro milling and selective laser Induced etching sle
Ultrafast laser system for laser micro milling and selective laser Induced etching sle(1)
Selective laser induced etching sle
Laser micro milling
Laser cutting
Laser cutting
Laser cutting
Ultrafast laser system selective laser induced etching sle2

Ultrafast Laser System for Selective Laser Etching (SLE) for High-Precision 3D Glass Microfabrication

The Ultrafast Laser System for Selective Laser Etching (SLE) is an advanced femtosecond laser solution designed for true three-dimensional microstructuring inside transparent materials such as glass and fused silica. By combining ultrashort pulse laser modification with selective chemical etching, this technology enables the fabrication of complex internal channels, cavities, and freeform geometries that are impossible with conventional surface machining. The non-thermal, maskless process ensures excellent dimensional accuracy, high aspect ratios, and superior surface quality. Ideal for microfluidics, photonics, biomedical devices, and advanced optics, SLE delivers unmatched precision for next-generation glass microfabrication.

This ultrafast laser platform integrates two complementary processes: laser micro-milling for precise surface structuring and Selective Laser-Induced Etching for true 3D internal fabrication. Femtosecond pulses locally modify glass at the focal volume through nonlinear absorption, enabling selective chemical etching of only the laser-modified regions. The result is the ability to form high-aspect-ratio channels, cavities, and waveguides inside transparent substrates while also performing surface milling and texturing. Advanced multi-axis motion and SLE-optimised software ensure micron-level alignment, depth control, and consistent outcomes across complex geometries.

ParameterSpecification
Working area300x300x200 / 600x400x200 mm
Wavelength
1030 / 515 / 343 nm (one, combination of two or all three)
Laser PowerUp to 80 W @1030 nm
Accuracy<1 µm
Working area300x300x200 / 600x400x200 mm
Wavelength
1030 / 515 / 343 nm (one, combination of two or all three)
Laser PowerUp to 80 W @1030 nm
Accuracy<1 µm

Ultrafast Femtosecond Pulse Processing

Ultrashort pulses confine energy to the focal region, enabling non-thermal material modification with minimal residual stress or microcracking.

True 3D Internal Structuring with SLE

Create enclosed channels, overhangs, and multi-level structures inside glass—capabilities not achievable with surface-only methods.

Precision Laser Micro-Milling

High-resolution surface milling and texturing deliver smooth finishes, sharp edges, and accurate depth control for micro-optical and fluidic interfaces.

High Aspect Ratio Capability

Supports structures exceeding 20:1 aspect ratios, ideal for microfluidics, MEMS supports, and optical interconnects.

Wide Glass and Transparent Material Compatibility

Processes fused silica, borosilicate glass, quartz, and other transparent substrates without compromising optical quality.

Advanced Motion and Focus Control

Multi-axis stages and high-NA optics enable accurate positioning in X, Y, and Z for complex volumetric designs.

SLE-Optimised CAD/CAM Workflow

Dedicated path planning and parameter control streamline design-to-production for repeatable, scalable manufacturing.

Clean, Maskless Manufacturing

Eliminates masks and extensive cleanroom infrastructure, reducing cost, lead time, and process complexity.

Microfluidics and Lab-on-Chip

Fabrication of leak-tight, enclosed microchannels, mixers, and multi-level networks for diagnostics, analysis, and organ-on-chip systems.

Photonics and Integrated Optics

Creation of buried waveguides, couplers, and hybrid photonic–fluidic structures with precise refractive control.

Biomedical and Analytical Devices

Microchambers, capillary arrays, and transparent pathways for implantable diagnostics, drug delivery, and chemical synthesis.

MEMS and High-Aspect-Ratio Glass Components

Internal supports, cavities, and hermetic features for sensors, encapsulation, and optical MEMS assemblies.

Advanced Optics and Diffractive Elements

Free-form micro-optics, phase plates, beam shapers, and diffractive surfaces integrated within glass substrates.

Semiconductor and Electronics Packaging

Embedded channels and voids for thermal management, optical routing, and compact interconnect solutions.

Aerospace and Defence

Optical alignment structures, sealed microchambers, and ruggedised photonic components for harsh environments.

United Spectrum Instruments delivers advanced ultrafast laser platforms for micro-milling and SLE with comprehensive support across India. We provide application consultation, sample validation, system integration, training, and long-term service to ensure successful deployment. Our expertise in femtosecond laser processing and glass microfabrication helps customers achieve reliable results, faster implementation, and scalable production. Partnering with United Spectrum Instruments means gaining a technology partner committed to precision engineering, innovation, and future-ready manufacturing solutions.

FAQs

SLE enables internal volume modification followed by selective chemical etching, allowing true 3D structures inside glass.

Yes, the platform supports both processes seamlessly for integrated surface and internal fabrication.

Internal features from 1–10 microns and high aspect ratios are achievable, depending on material and process settings.

 

Yes, with high-repetition-rate lasers and automated stages, the system supports scalable manufacturing.

Transparent substrates such as fused silica, borosilicate glass, quartz, and similar materials are fully supported.

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FAQs

SLE enables internal volume modification followed by selective chemical etching, allowing true 3D structures inside glass.

Yes, the platform supports both processes seamlessly for integrated surface and internal fabrication.

Internal features from 1–10 microns and high aspect ratios are achievable, depending on material and process settings.

 

Yes, with high-repetition-rate lasers and automated stages, the system supports scalable manufacturing.

Transparent substrates such as fused silica, borosilicate glass, quartz, and similar materials are fully supported.

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